Water in Vacuum Systems: Problems and Solutions
For many processes in vacuum, the presence of water is both undesirable and unavoidable. This review offers a qualitative look at a broad spectrum of water related issues and their solutions in vacuum technology. First, a systematic overview outlines the most important technical innovations and publ...
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Published in | E-journal of surface science and nanotechnology p. 2024-031 |
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Main Author | |
Format | Journal Article |
Language | English |
Published |
The Japan Society of Vacuum and Surface Science
19.09.2024
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Subjects | |
Online Access | Get full text |
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Summary: | For many processes in vacuum, the presence of water is both undesirable and unavoidable. This review offers a qualitative look at a broad spectrum of water related issues and their solutions in vacuum technology. First, a systematic overview outlines the most important technical innovations and publications from the last decades. Relevant properties of surfaces, materials and other contributors of water molecules are also discussed. Second, the review offers practical advice for a multitude of applications ranging from compact lab ultrahigh vacuum devices, production machines like coaters and etchers, to large-scale facilities for space simulation and extreme ultraviolet lithography. The goal of this article is to provide a comprehensive tutorial on effective water handling for users, designers and process engineers in basic research and industry. |
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ISSN: | 1348-0391 1348-0391 |
DOI: | 10.1380/ejssnt.2024-031 |