Development of Hybrid Tight-Binding Quantum Chemical Molecular Dynamics Method and Its Application to Boron Implantation into Preamorphized Silicon Substrate

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Bibliographic Details
Published inJapanese Journal of Applied Physics Vol. 45; no. 4S; p. 2970
Main Authors Masuda, Tsuyoshi, Tsuboi, Hideyuki, Koyama, Michihisa, Endou, Akira, Kubo, Momoji, Broclawik, Ewa, Miyamoto, Akira
Format Journal Article
LanguageEnglish
Published 01.04.2006
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ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.45.2970