Using Model for Assessment of Complementary Metal Oxide Semiconductor Technology and Roadmaps as a Pre-Simulation Program with Integrated Circuit Emphasis Model Generator for Early Technology and Circuit Simulation

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Published inJapanese Journal of Applied Physics Vol. 47; no. 5R; p. 3384
Main Authors Boeuf, Frederic, Sellier, Manuel, Payet, Fabrice, Borot, Bertrand, Skotnicki, Thomas
Format Journal Article
LanguageEnglish
Published 01.05.2008
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ISSN0021-4922
1347-4065
DOI10.1143/JJAP.47.3384

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Author Boeuf, Frederic
Skotnicki, Thomas
Borot, Bertrand
Sellier, Manuel
Payet, Fabrice
Author_xml – sequence: 1
  givenname: Frederic
  surname: Boeuf
  fullname: Boeuf, Frederic
– sequence: 2
  givenname: Manuel
  surname: Sellier
  fullname: Sellier, Manuel
– sequence: 3
  givenname: Fabrice
  surname: Payet
  fullname: Payet, Fabrice
– sequence: 4
  givenname: Bertrand
  surname: Borot
  fullname: Borot, Bertrand
– sequence: 5
  givenname: Thomas
  surname: Skotnicki
  fullname: Skotnicki, Thomas
BookMark eNptUdlKAzEUDaJgXd78gHyAU5NJZuljKXXDorg8D1nutJGZpCQp2h_1e8y4IBThwuXAOfcc7jlC-9ZZQOiMkjGlnF3c3k4fxrwaM1bzPTSijFcZJ2Wxj0aE5DTjkzw_REchvCZYFpyO0MdLMHaJF05Dh1vn8TQECKEHG7Fr8cz16w4GJPwWLyCKDt-_Gw34CXqjnNUbFZPqGdTKus4tt1hYjR-d0L1YByzS4AcP2ZPpN52IxtkE3dKLHr-ZuMI3NkJCETSeGa82JuJ5v16JYMJPqCuwkAjJZIg3F77b7tr9Kv9MTtBBK7oApz_7GL1czp9n19nd_dXNbHqXKUZozGrCNC2IlnnJpJR6wgQQWvKJKitRsSIvpCxIVbRET6TSlawVqYFVkgjKirplx-j8-67yLgQPbbP2pk-_aihphk6aoZOGV83QSaLnO3Rl4lfg6IXp_hd9AnGLlxU
CitedBy_id crossref_primary_10_1109_TED_2008_921274
crossref_primary_10_1016_j_sse_2010_04_029
Cites_doi 10.1109/55.2058
10.1109/16.784191
10.1109/TED.2008.917542
10.1109/16.877181
10.1109/TED.2007.904483
10.1109/16.987117
ContentType Journal Article
DBID AAYXX
CITATION
DOI 10.1143/JJAP.47.3384
DatabaseName CrossRef
DatabaseTitle CrossRef
DeliveryMethod fulltext_linktorsrc
Discipline Engineering
Physics
EISSN 1347-4065
ExternalDocumentID 10_1143_JJAP_47_3384
GroupedDBID AALHV
AAYXX
ACGFS
ACNCT
ADEQX
AI.
ALMA_UNASSIGNED_HOLDINGS
ATQHT
CITATION
F5P
IOP
IZVLO
KOT
MC8
N5L
QTG
RNS
VH1
ID FETCH-LOGICAL-c301t-803d150db263bbbd93ae01649c67a73525bb5075f0d9bcd7b8c08e37b0a1358f3
ISSN 0021-4922
IngestDate Thu Apr 24 22:57:59 EDT 2025
Tue Jul 01 01:04:11 EDT 2025
IsPeerReviewed true
IsScholarly true
Issue 5R
Language English
LinkModel OpenURL
MergedId FETCHMERGED-LOGICAL-c301t-803d150db263bbbd93ae01649c67a73525bb5075f0d9bcd7b8c08e37b0a1358f3
ParticipantIDs crossref_primary_10_1143_JJAP_47_3384
crossref_citationtrail_10_1143_JJAP_47_3384
ProviderPackageCode CITATION
AAYXX
PublicationCentury 2000
PublicationDate 2008-05-01
PublicationDateYYYYMMDD 2008-05-01
PublicationDate_xml – month: 05
  year: 2008
  text: 2008-05-01
  day: 01
PublicationDecade 2000
PublicationTitle Japanese Journal of Applied Physics
PublicationYear 2008
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([11]) 1999; 46
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7
8
9
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([5]) 2008; 55
10
References_xml – ident: [8]
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– ident: [13]
– volume: 9
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SSID ssj0026541
ssj0026590
ssj0026540
ssj0064762
Score 1.7875345
SourceID crossref
SourceType Enrichment Source
Index Database
StartPage 3384
Title Using Model for Assessment of Complementary Metal Oxide Semiconductor Technology and Roadmaps as a Pre-Simulation Program with Integrated Circuit Emphasis Model Generator for Early Technology and Circuit Simulation
Volume 47
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwnV3fa9swENbajsH2MLZuY90v9LA9GWdJJFvxY1Ja2kDWsLXQtyBZMhiauHgOtP1D9_fsTrItJ-ShWwgmdqRI4T5Ld-e77wj5agZaMKFZaIRIQ27ATpFCmjDJVGzkMDIj64ec_YjPrvj0Orre23_SiVpaV6qXPuzMK_kfqcI1kCtmyf6DZNsfhQvwGeQLR5AwHB8lY_e8H8uZ2SzEYNzSbNooC4wWd8Hh5X0wM5j2eHGXawMLxBIAsEKqV-jlvesuW7GQeilvf2MFGokhGuGvfFkX-cK8Agzncu7b84ZqQgfHeZmu8yo4AXBI5Dhxk3Kk1jgITs-RKW8N1_T0g2zoy7CXY43MYIfibINXfaz-pDDrzOniSJCRp63zCDlHHTJncrU2bUzJXN67RzGnUpW5h_ikKAt7fWLKqnQlTrxrZOQDEdtUBTCQE5f43DNuhWdcgNHsClQ0W4Aj_ayhHv3sLOhgwfPdOw1HxovpdDzvcdFrmm0Sem9ttG34o0sGZwvsveBigb33ydOhEDbS4Pxi3voM4gi5ePzJoHOStN_EXMQ1L777w02KB2ffu1PsKF8dLeryFXlZS5GOHZZfkz2zOiQvOqSYh-RZLdc35I_FN7VQogAg6vFNi4xu4JtafFOLb7qBb-oBR0GWtME3lfCmm_imNb4p4pt6fNMapbTBdz2pFt92ehbf28M1Pf0gb8nV6cnl8VlY1yEJU9j-KlDimAa7SathzJRSOmHSIDNdksZCCuQTVgrMqijr60SlWqhR2h8ZJlRfDlg0ytg7crAqVuY9odFACa1SmbAs5fCSgus4iTLQODSo7uaIBI2AFmlN0o-1Ym4WuzBzRL61rW8dOc3Odh8e2e4jee5vo0_koCrX5jPo3JX6YlH5FyQm3So
linkProvider IOP Publishing
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Ajournal&rft.genre=article&rft.atitle=Using+Model+for+Assessment+of+Complementary+Metal+Oxide+Semiconductor+Technology+and+Roadmaps+as+a+Pre-Simulation+Program+with+Integrated+Circuit+Emphasis+Model+Generator+for+Early+Technology+and+Circuit+Simulation&rft.jtitle=Japanese+Journal+of+Applied+Physics&rft.au=Boeuf%2C+Frederic&rft.au=Sellier%2C+Manuel&rft.au=Payet%2C+Fabrice&rft.au=Borot%2C+Bertrand&rft.date=2008-05-01&rft.issn=0021-4922&rft.eissn=1347-4065&rft.volume=47&rft.issue=5R&rft.spage=3384&rft_id=info:doi/10.1143%2FJJAP.47.3384&rft.externalDBID=n%2Fa&rft.externalDocID=10_1143_JJAP_47_3384
thumbnail_l http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/lc.gif&issn=0021-4922&client=summon
thumbnail_m http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/mc.gif&issn=0021-4922&client=summon
thumbnail_s http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/sc.gif&issn=0021-4922&client=summon