Processing of Nanoscale Gaps for Boron-doped Nanocrystalline Diamond Based MEMS

In this work we present a technological process flow enabling fabrication of transversal nanofeatures in nanocrystalline diamond based MEMS. Growth of thin diamond films on nanostructured templates, projection exposure lithography and bi-layer electron beam lithography are the key technologies used....

Full description

Saved in:
Bibliographic Details
Published inProcedia engineering Vol. 87; pp. 903 - 906
Main Authors Iankov, Dimitre, Zuerbig, Verena, Pletschen, Wilfried, Giese, Christian, Iannucci, Robert, Ambacher, Oliver, Lebedev, Vadim
Format Journal Article
LanguageEnglish
Published Elsevier Ltd 2014
Subjects
MEMS
microplate
nanocrystalline diamond
nanoscale gaps
nanoscale gaps
MEMS
microplate
nanocrystalline diamond
Online AccessGet full text

Cover

More Information
Summary:In this work we present a technological process flow enabling fabrication of transversal nanofeatures in nanocrystalline diamond based MEMS. Growth of thin diamond films on nanostructured templates, projection exposure lithography and bi-layer electron beam lithography are the key technologies used. Electrode gaps in the order of 100nm have been successfully accomplished with suspended microplates with dimensions of 1×1μm2.
ISSN:1877-7058
1877-7058
DOI:10.1016/j.proeng.2014.11.301