Design and performance analysis of Dual-Gate All around Core-Shell Nanotube TFET
In this research work, we have put forward Silicon based Nanotube structure with Dual Gate All around configuration. The proposed device has been compared with Conventional Nanowire structure and the comparison is concocted on account of analog parameters of both the devices. The structural paramete...
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Published in | Superlattices and microstructures Vol. 125; pp. 356 - 364 |
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Abstract | In this research work, we have put forward Silicon based Nanotube structure with Dual Gate All around configuration. The proposed device has been compared with Conventional Nanowire structure and the comparison is concocted on account of analog parameters of both the devices. The structural parameters of both the devices are kept identical like work function, doping concentrations of Source, Channel and Drain regions. By using an inner core gate and an outer shell gate, the proposed device exhibited superior Analog characteristics over its Nanowire counterpart in terms of drive current (ION), Electrical criteria, capacitance, unity gain, and transconductance.
•Dual Gate All around configuration over Tunnel FET is proposed and investigated.•Various analog/RF and process parameters are extracted and discussed.•Compared with Conventional Nanowire structure. |
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AbstractList | In this research work, we have put forward Silicon based Nanotube structure with Dual Gate All around configuration. The proposed device has been compared with Conventional Nanowire structure and the comparison is concocted on account of analog parameters of both the devices. The structural parameters of both the devices are kept identical like work function, doping concentrations of Source, Channel and Drain regions. By using an inner core gate and an outer shell gate, the proposed device exhibited superior Analog characteristics over its Nanowire counterpart in terms of drive current (ION), Electrical criteria, capacitance, unity gain, and transconductance.
•Dual Gate All around configuration over Tunnel FET is proposed and investigated.•Various analog/RF and process parameters are extracted and discussed.•Compared with Conventional Nanowire structure. |
Author | Amin, S. Intekhab Mushtaq, Umar Kumar, Naveen Anand, Sunny |
Author_xml | – sequence: 1 givenname: Naveen surname: Kumar fullname: Kumar, Naveen organization: Dr. B. R. Ambedkar National Institute of Technology Jalandhar, India – sequence: 2 givenname: Umar surname: Mushtaq fullname: Mushtaq, Umar organization: Amity University, Sector-125, Noida, Uttar Pradesh, India – sequence: 3 givenname: S. Intekhab surname: Amin fullname: Amin, S. Intekhab organization: Jamia Milia Islamia, Jamia Nagar, New Delhi, India – sequence: 4 givenname: Sunny surname: Anand fullname: Anand, Sunny email: sunnyanand.42@gmail.com organization: Amity University, Sector-125, Noida, Uttar Pradesh, India |
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Keywords | Nanowire Dual-Gate All around Core and shell gates TFET Nanotube |
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Comput. Electron. doi: 10.1007/s10825-016-0859-5 |
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