Design and performance analysis of Dual-Gate All around Core-Shell Nanotube TFET

In this research work, we have put forward Silicon based Nanotube structure with Dual Gate All around configuration. The proposed device has been compared with Conventional Nanowire structure and the comparison is concocted on account of analog parameters of both the devices. The structural paramete...

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Published inSuperlattices and microstructures Vol. 125; pp. 356 - 364
Main Authors Kumar, Naveen, Mushtaq, Umar, Amin, S. Intekhab, Anand, Sunny
Format Journal Article
LanguageEnglish
Published Elsevier Ltd 01.01.2019
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Abstract In this research work, we have put forward Silicon based Nanotube structure with Dual Gate All around configuration. The proposed device has been compared with Conventional Nanowire structure and the comparison is concocted on account of analog parameters of both the devices. The structural parameters of both the devices are kept identical like work function, doping concentrations of Source, Channel and Drain regions. By using an inner core gate and an outer shell gate, the proposed device exhibited superior Analog characteristics over its Nanowire counterpart in terms of drive current (ION), Electrical criteria, capacitance, unity gain, and transconductance. •Dual Gate All around configuration over Tunnel FET is proposed and investigated.•Various analog/RF and process parameters are extracted and discussed.•Compared with Conventional Nanowire structure.
AbstractList In this research work, we have put forward Silicon based Nanotube structure with Dual Gate All around configuration. The proposed device has been compared with Conventional Nanowire structure and the comparison is concocted on account of analog parameters of both the devices. The structural parameters of both the devices are kept identical like work function, doping concentrations of Source, Channel and Drain regions. By using an inner core gate and an outer shell gate, the proposed device exhibited superior Analog characteristics over its Nanowire counterpart in terms of drive current (ION), Electrical criteria, capacitance, unity gain, and transconductance. •Dual Gate All around configuration over Tunnel FET is proposed and investigated.•Various analog/RF and process parameters are extracted and discussed.•Compared with Conventional Nanowire structure.
Author Amin, S. Intekhab
Mushtaq, Umar
Kumar, Naveen
Anand, Sunny
Author_xml – sequence: 1
  givenname: Naveen
  surname: Kumar
  fullname: Kumar, Naveen
  organization: Dr. B. R. Ambedkar National Institute of Technology Jalandhar, India
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  givenname: Umar
  surname: Mushtaq
  fullname: Mushtaq, Umar
  organization: Amity University, Sector-125, Noida, Uttar Pradesh, India
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  givenname: S. Intekhab
  surname: Amin
  fullname: Amin, S. Intekhab
  organization: Jamia Milia Islamia, Jamia Nagar, New Delhi, India
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  givenname: Sunny
  surname: Anand
  fullname: Anand, Sunny
  email: sunnyanand.42@gmail.com
  organization: Amity University, Sector-125, Noida, Uttar Pradesh, India
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Keywords Nanowire
Dual-Gate All around
Core and shell gates
TFET
Nanotube
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Snippet In this research work, we have put forward Silicon based Nanotube structure with Dual Gate All around configuration. The proposed device has been compared with...
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SubjectTerms Core and shell gates
Dual-Gate All around
Nanotube
Nanowire
TFET
Title Design and performance analysis of Dual-Gate All around Core-Shell Nanotube TFET
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Volume 125
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