Insights into the degradation of sulfamethoxazole in UV/nitrite system: Mechanism, transformation process and disinfection by-products formation

• Published in: Journal of water process engineering Vol. 66; p. 106041
• Main Authors: Huang, Jiahui, Yang, Bufan, Ma, Xin, Zhang, Xin, Huang, Sinong, Du, Erdeng, Ma, Xiaoyan, Deng, Jing
• Format: Journal Article
• Language: English
• Published: Elsevier Ltd 01.09.2024
• Subjects: Degradation mechanism; Disinfection by-products; Nitrite; Sulfamethoxazole; UV; Disinfection by-products; Sulfamethoxazole; Degradation mechanism; Nitrite
• ISSN: 2214-7144; 2214-7144
• DOI: 10.1016/j.jwpe.2024.106041

Antibiotics removal from wastewater by conventional methods is limited, and their lingering presence in the environment can be hazardous to both human health and the ecosystem. Sulfamethoxazole (SMX) is one of the primary study subjects for antibiotic contamination, the degradation behavior, mechanism, transformation pathway, disinfection byproducts (DBPs) formation and variations about toxicity in UV/nitrite (NO2−) system were examined in this study. Compared with UV irradiation, the first-order reaction rate of SMX in UV/NO2− system rose from 0.0397 to 0.0528 min−1. This enhancement was linked to the generation of reactive oxygen species (ROS) and reactive nitrogen species (RNS), which promoted the degradation. SMX removal was more favorable under high dissolved oxygen (DO) levels and acidic conditions. When NO2− concentrations ranged from 0.1 to 1.0 mM, the higher concentration was more favorable to the degradation. The addition of 10 mM of HA and HCO3− hindered the oxidation of SMX by 48.46 % and 26.85 %, respectively, while the addition of Cl− slightly accelerated the decay of SMX at certain concentrations (5, 10 mM). The results of HPLC-ESI-MS and DFT computation suggested three possible SMX degradation pathways, including nitrification, hydroxylation, and bond breaking (such as sulfonamide cleavage). The primary DBPs produced by the post-chlorination of SMX in UV/NO2− system were TCM (87.02 % of the total detected DBPs) with a minor quantity of DBPs containing nitrogen. The presence of bromide ions (Br−) can lead to the production of highly toxic bromine containing disinfection by-products (Br-DBPs). After adding Br− in UV/NO2− system, 100 % of N-DBPs (TCNM, DCAN) and 93.43 % of C-DBPs (TCM, DCAA, TCAA) were converted to Br-DBPs (TBM, DBAA, TBAA, BDCM, DBCM), with the production of Br-DBPs accounting for 82.63 % of the detected DBPs. [Display omitted] •The favorable removal of SMX can be achieved by UV/NO2− treatment.•∙OH attacks SMX bonds more easily than NO2∙.•More toxic nitrification/nitrosation intermediates can be produced after UV/NO2− treatment.•The possible degradation pathways of SMX include bond breakage, hydroxylation and nitrification.•After UV/NO2−/Br− preoxidation, both C-DBPs and N-DBPS can be transformed into Br-DBPs.