Ion current optimization in a magnetron with tunable magnetic field configuration

Abstract The response of the ion current in the substrate region to the magnetic system configuration of a circular magnetron was studied during direct current sputtering of aluminum target. The unbalancing degree induced by changing of magnets’ positions was modelled with finite element methods. Th...

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Published inJournal of physics. Conference series Vol. 2064; no. 1; pp. 12061 - 12064
Main Authors Kaziev, A V, Ageychenkov, D G, Tumarkin, A V, Kolodko, D V, Sergeev, N S, Kharkov, M M, Leonova, K A
Format Journal Article
LanguageEnglish
Published IOP Publishing 01.11.2021
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Summary:Abstract The response of the ion current in the substrate region to the magnetic system configuration of a circular magnetron was studied during direct current sputtering of aluminum target. The unbalancing degree induced by changing of magnets’ positions was modelled with finite element methods. The ion saturation current in the substrate region showed more than twofold variation with unbalancing degree in the range 0.6–1.2. The dependence was non-monotonic, and the system was optimized to maximize the substrate ion current. The Langmuir probe diagnostics showed plasma density ~ 10 16 m −3 in the optimized magnetic configuration.
ISSN:1742-6588
1742-6596
DOI:10.1088/1742-6596/2064/1/012061