Three-dimensional micromachining of silicon using a nuclear microprobe

• Published in: Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms Vol. 222; no. 3; pp. 513 - 517
• Main Authors: Teo, E.J, Tavernier, E.P, Breese, M.B.H, Bettiol, A.A, Watt, F, Liu, M.H, Blackwood, D.J
• Format: Journal Article
• Language: English
• Published: Elsevier B.V 01.08.2004
• Subjects: Electrochemical etching; Porous silicon; Proton beam writing; Silicon micromachining; 07.78.+s; 42.82.Cr; 82.80.Fk; 85.85.+j; 61.80.Jh; Silicon micromachining; Porous silicon; Electrochemical etching; Proton beam writing

We describe a novel technique for silicon microfabrication based on energetic mega-electron-volt (MeV) helium irradiation and subsequent electrochemical etching. The ion-induced damage in the irradiated regions slows down the porous silicon formation during electrochemical etching, producing a raise...