On the phosphorus characterization in thin SiO2 (P,B) CVD layer deposited onto a silicon substrate by PIXE
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Published in | Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms Vol. 192; no. 3; pp. 311 - 317 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
01.05.2002
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Online Access | Get full text |
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ISSN: | 0168-583X |
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DOI: | 10.1016/S0168-583X(02)00475-5 |