Automated nanoliter solution deposition for total reflection X-ray fluorescence analysis of semiconductor samples

• Published in: Spectrochimica acta. Part B: Atomic spectroscopy Vol. 61; no. 10; pp. 1091 - 1097
• Main Authors: Sparks, Chris M., Gondran, Carolyn H., Havrilla, George J., Hastings, Elizabeth P.
• Format: Journal Article
• Language: English
• Published: Elsevier B.V 01.11.2006
• Subjects: Nanoliter dried spot deposition; Total reflection X-ray fluorescence; TXRF; Vapor phase decomposition; VPD; VPD; Vapor phase decomposition; Total reflection X-ray fluorescence; TXRF; Nanoliter dried spot deposition
• ISSN: 0584-8547; 1873-3565
• DOI: 10.1016/j.sab.2006.09.014

In this study, a BioDot BioJet dispensing system was investigated as a nanoliter sample deposition method for total reflection X-ray fluorescence (TXRF) analysis. The BioDot system was programmed to dispense arrays of 20 nL droplets of sample solution on Si wafers. Each 20 nL droplet was approximately 100 μm in diameter. A 10 × 10 array (100 droplets) was deposited and dried in less than 2 min at room temperature and pressure, demonstrating the efficiency of the automated deposition method. Solutions of various concentrations of Ni and Ni in different matrices were made from stock trace element standards to investigate of the effect of the matrix on the TXRF signal. The concentrations were such that the levels of TXRF signal saturation could be examined. Arrays were deposited to demonstrate the capability of drying 100 μL of vapor phase decomposition-like residue in the area of a typical TXRF detector.