Excellent data retention characteristic of Te-based conductive-bridge RAM using semiconducting Te filament for storage class memory
•The virgin resistance and forming voltage are decreased with increasing Zr composition in ZrxTe1−x (0.5 ≦ x ≦ 0.7) and decreasing electrolyte thickness.•The temperature-dependent resistance of the formed CF in Te-based CBRAM shows semiconducting behavior and a gradual change of conductance lower th...
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Published in | Solid-state electronics Vol. 153; pp. 8 - 11 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
Elsevier Ltd
01.03.2019
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Subjects | |
Online Access | Get full text |
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Summary: | •The virgin resistance and forming voltage are decreased with increasing Zr composition in ZrxTe1−x (0.5 ≦ x ≦ 0.7) and decreasing electrolyte thickness.•The temperature-dependent resistance of the formed CF in Te-based CBRAM shows semiconducting behavior and a gradual change of conductance lower than 1.0 G0 in the erase step.•Activation energy for the out-diffusion of Te atoms does not contribute significantly to the excellent retention characteristics of Te-CBRAM.
In this work, we explore the electrical properties and data retention of Te-based conductive-bridge random-access memory (CBRAM) of ZrxTe1−x/Al2O3/Pt cells. The virgin resistance and forming voltage are decreased with increasing Zr composition (0.5 ≦ x ≦ 0.7) and decreasing electrolyte thickness. The resistance of the conductive filament (CF) formed in the Te-CBRAM shows semiconducting behavior that is decreased with increasing temperature, whereas a Cu-based CBRAM shows metallic behavior. Furthermore, the conductance change of Te-based CBRAM, during the filament dissolution step, occurs with lower conductance units than those of Cu/Ag-based CBRAM. The most differentiable characteristics of both devices are the data retention. Te-based CBRAM shows better data stability at high temperature (150 °C) than Cu-based device. Accelerated tests (250, 270, and 300 °C) were performed to understand the data retention of the Te-CBRAM, yielding excellent retention characteristics (10 years at 177 °C) despite its relatively low activation energy (Ea, 1.07 eV) than Cu/Ag- based devices. We believe that the excellent retention properties of Te-based devices are more influenced by the wide effective CF size than by Ea. |
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ISSN: | 0038-1101 1879-2405 |
DOI: | 10.1016/j.sse.2018.12.008 |