Microdefects in an As-Grown Czochralski Silicon Crystal Studied by Synchrotron Radiation Section Topography with Aid of Computer Simulation

Grown-in microdefects of a Czochralski (CZ) silicon crystal grown at a slow growth rate were studied by section topography using high energy synchrotron radiation. Images of the microdefects in the section topographs were analyzed quantitatively using computer simulation based on the Takagi-Taupin t...

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Bibliographic Details
Published inJapanese Journal of Applied Physics Vol. 37; no. 1R; p. 241
Main Authors Satoshi Iida, Satoshi Iida, Yoshirou Aoki, Yoshirou Aoki, Kouhei Okitsu, Kouhei Okitsu, Yoshimitsu Sugita, Yoshimitsu Sugita, Hiroshi Kawata, Hiroshi Kawata, Takao Abe, Takao Abe
Format Journal Article
LanguageEnglish
Published 01.01.1998
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Summary:Grown-in microdefects of a Czochralski (CZ) silicon crystal grown at a slow growth rate were studied by section topography using high energy synchrotron radiation. Images of the microdefects in the section topographs were analyzed quantitatively using computer simulation based on the Takagi-Taupin type dynamical diffraction theory of X-rays, and reproduced successfully by the simulation when the microdefects were assumed to be spherical strain centers. Sizes and positions of the microdefects were able to be determined by detailed comparison between the experiments and the computer simulations. The validity of the computer simulation in an analysis of the section topographs is discussed.
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.37.241