Lithography for now and the future

•Amount of transistors on chip oubles every 1.5–2 years accordig to Moore’s law.•Multiple patterning is required to obtain ∼10–16 nm half-pitch using immersion lithography.•EUV scanners will extend Moore’s Law for the foreseeable future.•View of further extension of EUV in the future will be discuss...

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Bibliographic Details
Published inSolid-state electronics Vol. 155; pp. 20 - 26
Main Authors van de Kerkhof, M.A., Benschop, J.P.H., Banine, V.Y.
Format Journal Article
LanguageEnglish
Published Elsevier Ltd 01.05.2019
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Summary:•Amount of transistors on chip oubles every 1.5–2 years accordig to Moore’s law.•Multiple patterning is required to obtain ∼10–16 nm half-pitch using immersion lithography.•EUV scanners will extend Moore’s Law for the foreseeable future.•View of further extension of EUV in the future will be discussed in this article.
ISSN:0038-1101
1879-2405
DOI:10.1016/j.sse.2019.03.006