Diagnosis and Cleaning of Carbon Contamination on SiO2 Thin Film

  A contamination on a surface is a serious problem in thickness measurement especially for thin films less than ten nanometers. Water contact angles are sensitive to the surface condition and the degree of contamination and can be a very useful criterion for a judgment of the effect in practical cl...

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Bibliographic Details
Published inJournal of Surface Analysis Vol. 15; no. 3; pp. 337 - 340
Main Authors Kurokawa, Akira, Odaka, Kenji, Azuma, Yasushi, Fujimoto, Toshiyuki, Kojima, Isao
Format Journal Article
LanguageEnglish
Published The Surface Analysis Society of Japan 2009
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Summary:  A contamination on a surface is a serious problem in thickness measurement especially for thin films less than ten nanometers. Water contact angles are sensitive to the surface condition and the degree of contamination and can be a very useful criterion for a judgment of the effect in practical cleaning processes. The UV-ozone cleaning is the most effective one in removal of carbon contamination in the method we investigated.
ISSN:1341-1756
1347-8400
DOI:10.1384/jsa.15.337