The Under Potential Deposition of Cu on Au (111) in Nonaqueous Acetonitrile

The underpotential deposition (UPD) of Copper on Au(111) in nonaqueous acetonitrile/perchlorate electrolyte has been investigated. The deposition mechanism is thereby strongly influenced by coadsorbed acetonitrile molecules and the stability of the solvation shell around the Cu(I) ions. The UPD mech...

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Published inZeitschrift für physikalische Chemie (Neue Folge) Vol. 226; no. 9; pp. 953 - 963
Main Authors Pekmez, Kadir, Avci, E., Baumgärtel, Helmut Gustav, Donner, Constanze
Format Journal Article
LanguageEnglish
Published De Gruyter Oldenbourg 01.10.2012
Subjects
Acetonitrile
Cu Under Potential Deposition
Nonaqueous Electrolyte
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Summary:The underpotential deposition (UPD) of Copper on Au(111) in nonaqueous acetonitrile/perchlorate electrolyte has been investigated. The deposition mechanism is thereby strongly influenced by coadsorbed acetonitrile molecules and the stability of the solvation shell around the Cu(I) ions. The UPD mechanism obeys a two step mechanism even in presence of only none specifically adsorbing perchlorate ions. Thereby the first sub monolayer of copper is stabilized by coadsorbed acetonitrile molecules. However already 5% vol water content changes the structure within the double layer and consequently degrades the copper sub monolayer. At about 20% vol water content the Cu(I) ion/solvent complex is still stable. The reduction of Cu(I) ions from this complex is much faster compared to the reduction from the respective Cu(II) water complex.
ISSN:0942-9352
2196-7156
DOI:10.1524/zpch.2012.0306