Effects of Pretreatment Methods on the Enamel Surface Improving Sealant Adhesion
Is PlasBeam pretreatment an efficient method to improve sealant adhesion onto the enamel surface?The aim of this study isto investigate the effects induced by three pretreatment techniques used to improve sealant adhesion on the enamel surface, respectively standard acid-etching, UV radiations and a...
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Published in | Journal of biomimetics, biomaterials and biomedical engineering Vol. 40; p. 92 |
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Main Authors | , , , , , |
Format | Journal Article |
Language | English |
Published |
Pfäffikon
Trans Tech Publications Ltd
01.02.2019
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Subjects | |
Online Access | Get full text |
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Summary: | Is PlasBeam pretreatment an efficient method to improve sealant adhesion onto the enamel surface?The aim of this study isto investigate the effects induced by three pretreatment techniques used to improve sealant adhesion on the enamel surface, respectively standard acid-etching, UV radiations and a new method based on plasma operating at atmospheric pressure, namely the PlasBeam method.The physical-chemical modifications induced onto the enamel surface by the above pretreatments were analyzed using Contact Angle Measurements and Diffuse Reflectance Spectroscopy.The changes in the enamel surface morphology show that the acid-etching pretreatment is mostly efficient in increasing roughness, but this method stimulates the degradation processes that are well-known and turns down the brillianceof the treated surface. On the other hand, the PlasBeam treatment brings a higher roughness at the contact area between sealant and the enamel surface, compared to the UV radiations pretreatments.Moreover, the PlasBeam improves the hydrophilic character of enamel as a practical solution in enhancing the sealant adhesion to the surface. Related to other effects, it has been noticed that thePlasBeam method generates the most reflective enamel surface, whereas the White/Yellow index reaches the minimum level after a 10 second treatment. |
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ISSN: | 2296-9837 2296-9845 |
DOI: | 10.4028/www.scientific.net/JBBBE.40.92 |