Effect of Tl-codeposition on Au Electrodeposition from Non-Cyanide Bath

Effect of Tl on the electrodeposition behavior of Au was investigated by electrochemical analysis, total-reflection X-ray fluorescene analysis, XRD, glow discharge optical emission spectrometer (GD-OES) and hardness measurement. The deposition rate increased with an increase in the amount of Tl addi...

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Bibliographic Details
Published inECS transactions Vol. 25; no. 34; pp. 87 - 96
Main Authors Saito, Mikiko, Inoue, Koichiro, Shiokawa, Kazuhiko, Homma, Takayuki
Format Journal Article
LanguageEnglish
Published 22.02.2010
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Summary:Effect of Tl on the electrodeposition behavior of Au was investigated by electrochemical analysis, total-reflection X-ray fluorescene analysis, XRD, glow discharge optical emission spectrometer (GD-OES) and hardness measurement. The deposition rate increased with an increase in the amount of Tl addition to the bath. Tl was co-deposited at the interface between the seed layer and the Au films, as well as in the films. In as-deposited condition, the Tl contained films exhibited higher hardness compared with the Tl-free films, while both of them showed almost the same hardness after annealing. It was suggested that the hardness is correlated with the crystal orientation of the grains.
ISSN:1938-5862
1938-6737
DOI:10.1149/1.3335495