Inertial-grade in-plane resonant silicon accelerometer
A micro-G detectable in-plane vibrating accelerometer is implemented by using a single crystalline silicon and glass-silicon anodic-bonded vacuum packaging technique. The sensing principle of the accelerometer is a gap-sensitive electrostatic stiffness changing effect. A mixed surface-bulk micromach...
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Published in | Electronics letters Vol. 42; no. 19; pp. 1092 - 1094 |
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Main Authors | , |
Format | Journal Article |
Language | English |
Published |
London
Institution of Electrical Engineers
14.09.2006
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Subjects | |
Online Access | Get full text |
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Summary: | A micro-G detectable in-plane vibrating accelerometer is implemented by using a single crystalline silicon and glass-silicon anodic-bonded vacuum packaging technique. The sensing principle of the accelerometer is a gap-sensitive electrostatic stiffness changing effect. A mixed surface-bulk micromachining technology has been developed to use 40mum-thick silicon as a structure material. The fabricated accelerometer shows a resolution of 5.2muG and 128Hz/G at the nominal frequency of 23.4kHz. |
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Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0013-5194 1350-911X |
DOI: | 10.1049/el:20061774 |