Effects of Alternating Pulse Bias Stress on Amorphous InGaZnO Thin Film Transistors

Amorphous InGaZnO (a-IGZO) TFTs attracted more demands due to the transparency and high mobility. Since TFTs are always exposed to both positive and negative gate bias, the alternating pulse bias stress tests are required to ensure stable TFT characteristics. In this paper, the effects of alternatin...

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Bibliographic Details
Published inECS transactions Vol. 45; no. 7; pp. 111 - 117
Main Authors Park, Suehye, Cho, Edward N., Yun, Ilgu
Format Journal Article
LanguageEnglish
Published The Electrochemical Society, Inc 27.04.2012
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Summary:Amorphous InGaZnO (a-IGZO) TFTs attracted more demands due to the transparency and high mobility. Since TFTs are always exposed to both positive and negative gate bias, the alternating pulse bias stress tests are required to ensure stable TFT characteristics. In this paper, the effects of alternating pulse bias stress on the threshold voltage shift (ΔVth) of a-IGZO TFTs with respect to the channel length (L) and the stress time interval (Tinterval) are investigated using the concepts of the stretched-exponential function and the density of total trap states (NT).
ISSN:1938-5862
1938-6737
DOI:10.1149/1.3701531