A 250-310 GHz Power Amplifier With 15-dB Peak Gain in 130-nm SiGe BiCMOS Process for Terahertz Wireless System

This article presents a broadband THz power amplifier (PA) operating close to the maximum oscillation frequency ( f max ) with proposed power combining and stagger-tuned gain boosting techniques. A compact broadband power combiner based on the compensated three-conductor transmission line (T-line) b...

Full description

Saved in:
Bibliographic Details
Published inIEEE transactions on terahertz science and technology Vol. 12; no. 1; pp. 1 - 12
Main Authors Li, Xingcun, Chen, Wenhua, Zhou, Peigen, Wang, Yunfan, Huang, Fei, Li, Shuyang, Chen, Jixin, Feng, Zhenghe
Format Journal Article
LanguageEnglish
Published Piscataway IEEE 01.01.2022
The Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:This article presents a broadband THz power amplifier (PA) operating close to the maximum oscillation frequency ( f max ) with proposed power combining and stagger-tuned gain boosting techniques. A compact broadband power combiner based on the compensated three-conductor transmission line (T-line) balun is proposed to simultaneously achieve broadband matching and power combining. A 4-stage stagger-tuned gain boosting amplifier operating closely to f max is investigated to achieve a flattened power gain. Based on the proposed techniques, a broadband 300-GHz PA is implemented in a 130-nm SiGe BiCMOS process with f t / f max = 350/450 GHz. It exhibits a peak gain of 15 dB and 3-dB bandwidth of 67 GHz (247-314 GHz) with 2.5 V supply voltage. At 290 GHz, a 5-dBm maximum output power P OUT-MAX was measured with a 1-dB compressed output power OP −1 dB of 3.3 dBm and a maximum PAE of 1.19%. The measured output power P OUT-MAX and OP -1dB of the PA are 2.2-5 dBm and 0.6-3.3 dBm over 250-300 GHz, respectively. To the best of our knowledge, this PA achieves the highest operational frequency and widest bandwidth compared with other works in SiGe/CMOS process operating closely to f max .
Bibliography:ObjectType-Article-1
SourceType-Scholarly Journals-1
ObjectType-Feature-2
content type line 14
ISSN:2156-342X
2156-3446
DOI:10.1109/TTHZ.2021.3099057