Chemical Vapor‐Deposited Boron Nitride Film on Silicon as a Boron Diffusion Source

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Bibliographic Details
Published inJournal of the Electrochemical Society Vol. 131; no. 6; pp. 1384 - 1388
Main Authors Kim, Chol, Sohn, Byung‐Ki, Shono, Katsufusa
Format Journal Article
LanguageEnglish
Published 01.06.1984
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ISSN:0013-4651
1945-7111
DOI:10.1149/1.2115853