Modeling approaches for electron beam lithography

In this paper, a study based on the mathematical modelling, applying different process simulation tools (CASINO, TREM, SELID) for characterization of PMMA resist and for the improvement of the resolution concerning the critical dimensions of nano-patterning by electron beam lithography (EBL) is pres...

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Bibliographic Details
Published inJournal of physics. Conference series Vol. 1089; no. 1; pp. 12016 - 12023
Main Authors Koleva, E, Vutova, K, Asparuhova, B, Kostic, I, Cvetkov, K, Gerasimov, V
Format Journal Article
LanguageEnglish
Published Bristol IOP Publishing 01.09.2018
Subjects
Electron beam lithography
Monte Carlo simulation
Physics
Proximity effect (electricity)
Regression models
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Summary:In this paper, a study based on the mathematical modelling, applying different process simulation tools (CASINO, TREM, SELID) for characterization of PMMA resist and for the improvement of the resolution concerning the critical dimensions of nano-patterning by electron beam lithography (EBL) is presented. Data for important EBL characteristics (energy deposition function, proximity effect parameters, solubility rate, etc.) are obtained by applying different approaches (Monte Carlo methods, regression models, etc.).
ISSN:1742-6588
1742-6596
DOI:10.1088/1742-6596/1089/1/012016