Light absorption and nanofocusing on a tapered magnetic metasurface

A type of metasurface was constructed on a silicon wafer using a nanopatterned magnetic film to achieve ideal light absorption within a wide wavelength range of 3 μm–15 μm. Using the metasurface, the surface electrons could be localized efficiently into an arrayed planar magnetic nanotip and then mo...

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Bibliographic Details
Published inApplied physics letters Vol. 117; no. 24
Main Authors Wei, Dong, Hu, Chai, Chen, Mingce, Shi, Jiashuo, Luo, Jun, Wang, Haiwei, Xie, Changsheng, Zhang, Xinyu
Format Journal Article
LanguageEnglish
Published Melville American Institute of Physics 14.12.2020
Subjects
Aluminum
Applied physics
Arrays
Electric fields
Electromagnetic absorption
Infrared analysis
Magnetic films
Metasurfaces
Reflectance
Silicon wafers
Surface chemistry
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Summary:A type of metasurface was constructed on a silicon wafer using a nanopatterned magnetic film to achieve ideal light absorption within a wide wavelength range of 3 μm–15 μm. Using the metasurface, the surface electrons could be localized efficiently into an arrayed planar magnetic nanotip and then modulated by configuring the surface architecture to produce remarkable infrared reflectivity variation. A theoretical analysis showed that the excited surface plasmon exhibit stronger electric field components at the common metal-to-air interface. The Tb14Fe68Co18 nanotip array provided more powerful nanofocusing and a lower infrared reflectivity than an array shaped on a traditional aluminum film. By adjusting the structural parameters of the nanorhombus array formed on the TbCo film system, the convergent light spot could be modulated to improve light absorption markedly.
Bibliography:ObjectType-Article-1
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content type line 14
ISSN:0003-6951
1077-3118
DOI:10.1063/5.0026073