Dynamic calibration of low-range silicon pressure sensors

Two methods of dynamic calibration of low-pressure piezoresistive sensors are presented and related to each other. The first method consists of the generation of standing waves in a tube of the length corresponding to the wave frequency. The change of the wave frequency allows one to obtain (step by...

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Bibliographic Details
Published inIEEE transactions on instrumentation and measurement Vol. 51; no. 6; pp. 1358 - 1362
Main Authors Zakrzewski, J., Wrobel, K.
Format Journal Article
LanguageEnglish
Published IEEE 01.12.2002
Subjects
Calibration
Electric shock
Frequency response
Piezoresistance
Pipelines
Pressure measurement
Pulse shaping methods
Resonant frequency
Shape
Silicon
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Summary:Two methods of dynamic calibration of low-pressure piezoresistive sensors are presented and related to each other. The first method consists of the generation of standing waves in a tube of the length corresponding to the wave frequency. The change of the wave frequency allows one to obtain (step by step) the whole frequency response of the sensor. The second method consists of the recording of the down-step time response of the sensor. The main difficulty of the second method lies in obtaining the proper shape of the pressure drop. It has been found that the inlet tube length is essential in obtaining successful results. Comparison of both methods shows satisfactory agreement of the calibration results.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0018-9456
1557-9662
DOI:10.1109/TIM.2002.808030