A Simple Method to Create Corners for the Lookup Table-Based MOSFET Models Through Inputs and Outputs Mapping

This article presents a simple method to create corner models to capture process variations for the lookup table-based MOSFET models through inputs and outputs mapping. The electrical specifications, including the threshold voltage, peak transconductance, ON-state resistance, saturation current, and...

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Bibliographic Details
Published inIEEE transactions on electron devices Vol. 68; no. 4; pp. 1432 - 1438
Main Author Xia, Kejun
Format Journal Article
LanguageEnglish
Published New York IEEE 01.04.2021
The Institute of Electrical and Electronics Engineers, Inc. (IEEE)
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Summary:This article presents a simple method to create corner models to capture process variations for the lookup table-based MOSFET models through inputs and outputs mapping. The electrical specifications, including the threshold voltage, peak transconductance, ON-state resistance, saturation current, and gate oxide thickness, can be fitted through five model parameters. The effectiveness of the method is demonstrated by both the FinFET model BSIM-CMG and the planar MOSFET measurement data.
ISSN:0018-9383
1557-9646
DOI:10.1109/TED.2021.3059191