Low-Loss Waveguide Fabrication by Inkjet Printing on Porous Silicon

We report fabrication of optical waveguides embedded in oxidized porous silicon in a maskless process. Patterned pore-filling was attained by means of inkjet printing, enabling lateral modification of the waveguide's index of refraction, and other optical properties, thus providing full two-dim...

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Bibliographic Details
Published inJournal of lightwave technology Vol. 37; no. 14; pp. 3439 - 3443
Main Authors Kellarev, Alexander, Ruschin, Shlomo
Format Journal Article
LanguageEnglish
Published New York IEEE 15.07.2019
The Institute of Electrical and Electronics Engineers, Inc. (IEEE)
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Summary:We report fabrication of optical waveguides embedded in oxidized porous silicon in a maskless process. Patterned pore-filling was attained by means of inkjet printing, enabling lateral modification of the waveguide's index of refraction, and other optical properties, thus providing full two-dimensional refractive index control of the optical waveguide. The waveguides were created by applying a KDP salt solution over a porous silicon film by means of a material printer. Light guiding was demonstrated at wavelengths 1.064 and 1.550 μm. Measured values of the propagation loss at these wavelengths were 2.4 dB/cm and below 0.5 dB/cm, respectively.
ISSN:0733-8724
1558-2213
DOI:10.1109/JLT.2019.2914503