Bendable Microwave AlGaN/GaN High-Electron-Mobility Transistor With Output Power Density of 2.65 W/mm

Flexible radio frequency (RF) devices are in high demand for wearable electronics; however, they currently do not offer sufficient output power for application in fifth-generation wireless communication systems. This paper reports a bendable gallium nitride (GaN) high-electron-mobility-transistor (H...

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Bibliographic Details
Published inIEEE electron device letters Vol. 42; no. 5; pp. 677 - 680
Main Authors Wang, Yan, Wu, Qingzhi, Mao, Shuman, Xu, Ruimin, Yan, Bo, Xu, Yuehang
Format Journal Article
LanguageEnglish
Published New York IEEE 01.05.2021
The Institute of Electrical and Electronics Engineers, Inc. (IEEE)
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Summary:Flexible radio frequency (RF) devices are in high demand for wearable electronics; however, they currently do not offer sufficient output power for application in fifth-generation wireless communication systems. This paper reports a bendable gallium nitride (GaN) high-electron-mobility-transistor (HEMT) with state-of-the-art output power in the microwave band. In this study, a fabrication method is proposed, where HEMT is originally grown on silicon carbide (SiC) substrates. After thinning the SiC substrates down to <inline-formula> <tex-math notation="LaTeX">5~\mu \text{m} </tex-math></inline-formula>, HEMT is transferred using a copper film rather than flexible substrates used in other studies. The measurements indicated that the fabricated devices exhibited a saturation output power of 2.65 W, corresponding to a power density of 2.65 W/mm, which was associated with maximum power added efficiency (PAE) of 51% at 3 GHz. The performance of the fabricated device remained stable even with a bending radius of up to 0.6 cm. These results indicated that the proposed fabrication method can potentially be used to realize high-power flexible RF electronics.
ISSN:0741-3106
1558-0563
DOI:10.1109/LED.2021.3068738