A New Low-Capacitance High-Voltage-Tolerant Protection Clamp for High-Speed Applications
A new low-capacitance clamp is introduced for high-voltage-tolerant and high-speed interface applications. An embedded stacking architecture is proposed to address latch-up-immune design requirements without degradation in the electrostatic discharge (ESD) stress-handling capability, leakage, or cap...
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Published in | IEEE transactions on electron devices Vol. 67; no. 8; pp. 3030 - 3034 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
New York
IEEE
01.08.2020
The Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Subjects | |
Online Access | Get full text |
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Summary: | A new low-capacitance clamp is introduced for high-voltage-tolerant and high-speed interface applications. An embedded stacking architecture is proposed to address latch-up-immune design requirements without degradation in the electrostatic discharge (ESD) stress-handling capability, leakage, or capacitance. Thanks to a parallel current conduction path activated during ESD stress, a state-of-the-art failure threshold current per unit area is obtained for high-voltage-tolerant interface applications in sub-28-nm CMOS process technologies. The device design concept introduced in this article facilitates the implementation of compact, high-performance interface applications, extended in general to protection clamp devices requiring a higher holding voltage. |
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ISSN: | 0018-9383 1557-9646 |
DOI: | 10.1109/TED.2020.3002877 |