Time-Domain Characterization of Photonic Integrated Filters Subject to Fabrication Variations

• Published in: Journal of lightwave technology Vol. 37; no. 21; pp. 5561 - 5570
• Main Authors: Ye, Yinghao, Wang, Mi, Spina, Domenico, Bogaerts, Wim, Dhaene, Tom
• Format: Journal Article
• Language: English
• Published: New York IEEE 01.11.2019; The Institute of Electrical and Electronics Engineers, Inc. (IEEE)
• Subjects: Baseband; Circuit design; Computational modeling; Computer simulation; Fabrication variations; Integrated circuit modeling; Integrated circuits; Modelling; Performance degradation; photonic integrated circuits; Photonics; polynomial Chaos; Polynomials; Random variables; Stochastic processes; Time domain analysis; time-domain variability analysis; Wave filters
• ISSN: 0733-8724; 1558-2213
• DOI: 10.1109/JLT.2019.2933311

Fabrication variations are a key factor to degrade the performance of photonic integrated circuits (PICs), and especially wavelength filters. We propose an efficient modeling approach to quantify the effects of fabrication variations on the time-domain performance of linear passive photonic integrated circuits (including the wavelength filters) in the design stage, before fabrication. In particular, this novel approach conjugates the accuracy of the Polynomial Chaos (PC) expansion in describing stochastic variations and the efficiency of a Vector Fitting (VF)-based baseband modeling technique in performing time-domain simulations. A suitable example validates the performance of the proposed method.