Thick, three-dimensional nanoporous density-graded materials formed by optical exposures of photopolymers with controlled levels of absorption

Three-dimensional (3D) intensity distributions generated by light passing through conformal phase masks can be modulated by the absorption property of photosensitive materials. The intensity distributions have extremely long depth of focus, which is proportional to the size of the phase masks, and t...

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Bibliographic Details
Published inApplied optics (2004) Vol. 46; no. 25; p. 6350
Main Authors Nam, Yun-Suk, Jeon, Seokwoo, Shir, Daniel Jay-Lee, Hamza, Alex, Rogers, John A
Format Journal Article
LanguageEnglish
Published United States 01.09.2007
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Summary:Three-dimensional (3D) intensity distributions generated by light passing through conformal phase masks can be modulated by the absorption property of photosensitive materials. The intensity distributions have extremely long depth of focus, which is proportional to the size of the phase masks, and this enables one to pattern thick (approximately 100 microm), nanoporous structures with precise control of grade density. Various density-graded 3D structures that result from computational modeling are demonstrated. Results of x-ray radiograph and the controlled absorption coefficient prove the dominant mechanism of the generated graded density is absorption of the photosensitive materials. The graded-density structures can be applied to a chemical reservoir for controlled release of chemicals and laser target reservoirs useful to shape shockless wave compression.
ISSN:1559-128X
DOI:10.1364/AO.46.006350