Comparison of the exposure characteristics of soft-x-ray film SIOFM-5FW with Kodak 101-05 and Ilford Q-plates
In identical exposure and processing conditions, we compare the exposure characteristics of soft-x-ray film, SIOFM-5FW, with Kodak101-05 and Ilford Q-plates in the soft-x-ray and extreme UV region below 100 nm, using D-19 and Phenisol developers. The experimental results show that for radiation grea...
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Published in | Applied optics (2004) Vol. 36; no. 13; p. 2843 |
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Main Authors | , , |
Format | Journal Article |
Language | English |
Published |
United States
01.05.1997
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Online Access | Get more information |
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Summary: | In identical exposure and processing conditions, we compare the exposure characteristics of soft-x-ray film, SIOFM-5FW, with Kodak101-05 and Ilford Q-plates in the soft-x-ray and extreme UV region below 100 nm, using D-19 and Phenisol developers. The experimental results show that for radiation greater than 10 nm, the response of SIOFM-5FW lies between the Kodak101-05 and the Ilford Q-plates but is closer to the former. For radiation of less than 10 nm, the SIOFM-5FW is more sensitive than the Kodak101-05 plate, with a higher saturated optical density, a higher dynamic range, and an obvious carbon K absorption edge structure in the spectra obtained. The effects of the two developers used on the exposure characteristics are discussed. |
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ISSN: | 1559-128X |
DOI: | 10.1364/AO.36.002843 |