Emissivity and electrical resistivity of titanium alloys with aluminum and vanadium
The results are presented of the simultaneous measurements of the integral hemispherical emissivity, ɛ th , and electrical resistance, ρ , of model alloys of titanium doped by aluminum and vanadium. The aluminum content in the solid solutions of the Ti-Al system didn’t exceed 10.5% (at.). Adding of...
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Published in | High temperature Vol. 50; no. 4; pp. 475 - 478 |
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Main Author | |
Format | Journal Article |
Language | English |
Published |
Dordrecht
SP MAIK Nauka/Interperiodica
01.07.2012
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Subjects | |
Online Access | Get full text |
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Summary: | The results are presented of the simultaneous measurements of the integral hemispherical emissivity, ɛ
th
, and electrical resistance,
ρ
, of model alloys of titanium doped by aluminum and vanadium. The aluminum content in the solid solutions of the Ti-Al system didn’t exceed 10.5% (at.). Adding of vanadium as the second dopant to the same materials was within 2–3% (at.).
The experimental data on ɛ
th
are presented for the temperature range of 700–1700 K and on
ρ
, for 77–1700 K. The experimental results show that it is impossible to establish any mutual correlation between the volumetric and the surface properties of the alloys investigated. |
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ISSN: | 0018-151X 1608-3156 |
DOI: | 10.1134/S0018151X12040049 |