Emissivity and electrical resistivity of titanium alloys with aluminum and vanadium

The results are presented of the simultaneous measurements of the integral hemispherical emissivity, ɛ th , and electrical resistance, ρ , of model alloys of titanium doped by aluminum and vanadium. The aluminum content in the solid solutions of the Ti-Al system didn’t exceed 10.5% (at.). Adding of...

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Bibliographic Details
Published inHigh temperature Vol. 50; no. 4; pp. 475 - 478
Main Author Belskaya, E. A.
Format Journal Article
LanguageEnglish
Published Dordrecht SP MAIK Nauka/Interperiodica 01.07.2012
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Summary:The results are presented of the simultaneous measurements of the integral hemispherical emissivity, ɛ th , and electrical resistance, ρ , of model alloys of titanium doped by aluminum and vanadium. The aluminum content in the solid solutions of the Ti-Al system didn’t exceed 10.5% (at.). Adding of vanadium as the second dopant to the same materials was within 2–3% (at.). The experimental data on ɛ th are presented for the temperature range of 700–1700 K and on ρ , for 77–1700 K. The experimental results show that it is impossible to establish any mutual correlation between the volumetric and the surface properties of the alloys investigated.
ISSN:0018-151X
1608-3156
DOI:10.1134/S0018151X12040049