Generalized guide for MOSFET miniaturization
As MOSFET dimensions are reduced, lower voltages, shallower junctions, thinner oxides, and heavier doping help to maintain long-channel behavior. A simple, empirical relation has been found between these parameters and the minimum channel length for which long-channel subthreshold behavior will be o...
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Published in | IEEE electron device letters Vol. 1; no. 1; pp. 2 - 4 |
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Main Authors | , , , |
Format | Journal Article |
Language | English |
Published |
IEEE
01.01.1980
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Subjects | |
Online Access | Get full text |
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Summary: | As MOSFET dimensions are reduced, lower voltages, shallower junctions, thinner oxides, and heavier doping help to maintain long-channel behavior. A simple, empirical relation has been found between these parameters and the minimum channel length for which long-channel subthreshold behavior will be observed. This approximate relation provides an estimate for MOSFET parameters not requiring reduction of all dimensions by the same scale factor. |
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Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0741-3106 1558-0563 |
DOI: | 10.1109/EDL.1980.25205 |