A modular bipolar power supply for high-power ion-plasma installations

The circuitry solutions, design, and main parameters of a modular pulse bipolar power-supply unit for high-power ion-plasma facilities are described. The modular principle of designing power supplies provided their application in various processes. The results of tests of the developed device as the...

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Bibliographic Details
Published inInstruments and experimental techniques (New York) Vol. 57; no. 5; pp. 594 - 600
Main Authors Oskirko, V. O., Sochugov, N. S., Pavlov, A. P.
Format Journal Article
LanguageEnglish
Published Moscow Pleiades Publishing 01.09.2014
Subjects
Electrical Engineering
Electronics and Radio Engineering
Measurement Science and Instrumentation
Physical Chemistry
Physics
Physics and Astronomy
Power Unit
Cathode Spot
Bipolar Pulse
Glow Discharge
Output Pulse
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Summary:The circuitry solutions, design, and main parameters of a modular pulse bipolar power-supply unit for high-power ion-plasma facilities are described. The modular principle of designing power supplies provided their application in various processes. The results of tests of the developed device as the power supply of a magnetron sputtering system with a power of 60 kW and a high-voltage power supply of the substrate bias voltage with a power of up to 40 kW are presented. The efficiency of applying bipolar pulses for preventing arcing at the magnetron cathode is experimentally demonstrated.
ISSN:0020-4412
1608-3180
DOI:10.1134/S0020441214050091