A power supply for magnetron sputtering systems

A design and electric circuits of the power supply for magnetron sputtering systems with a power of up to 5 kW are described. The power supply is intended for operation in direct-current (DC) or pulse modes with a pulse repetition rate of up to 100 kHz. The arc suppression system limits the energy d...

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Bibliographic Details
Published inInstruments and experimental techniques (New York) Vol. 56; no. 2; pp. 178 - 184
Main Authors Sochugov, N. S., Oskirko, V. O., Spirin, R. E.
Format Journal Article
LanguageEnglish
Published Dordrecht SP MAIK Nauka/Interperiodica 01.03.2013
Subjects
Electrical Engineering
Electronics and Radio Engineering
Measurement Science and Instrumentation
Physical Chemistry
Physics
Physics and Astronomy
Pulse Repetition Rate
Duty Factor
Aluminum Dope Zinc Oxide
Cathode Spot
Pulse Mode
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Summary:A design and electric circuits of the power supply for magnetron sputtering systems with a power of up to 5 kW are described. The power supply is intended for operation in direct-current (DC) or pulse modes with a pulse repetition rate of up to 100 kHz. The arc suppression system limits the energy delivered to the arc discharge at about 110 mJ in the DC mode and 9 mJ in the pulse mode, respectively. The possibilities of optimizing coatings by selecting working parameters of the power supply were demonstrated by the example of thin-film coatings of two types (Ag and Ga-doped ZnO thin films).
ISSN:0020-4412
1608-3180
DOI:10.1134/S0020441213010302