Electrodeposition of bismuth, tellurium, and bismuth telluride thin films from choline chloride–oxalic acid ionic liquid
This article presents a series of preliminary results regarding the electrodeposition of bismuth, tellurium, and bismuth telluride films at 60 °C from ionic liquids, containing a mixture of choline chloride and oxalic acid (ChCl–OxA). Ten millimolar concentration solutions of BiCl 3 and TeO 2 were u...
Saved in:
Published in | Journal of applied electrochemistry Vol. 43; no. 3; pp. 309 - 321 |
---|---|
Main Authors | , , , |
Format | Journal Article |
Language | English |
Published |
Dordrecht
Springer Netherlands
01.03.2013
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | This article presents a series of preliminary results regarding the electrodeposition of bismuth, tellurium, and bismuth telluride films at 60 °C from ionic liquids, containing a mixture of choline chloride and oxalic acid (ChCl–OxA). Ten millimolar concentration solutions of BiCl
3
and TeO
2
were used as precursors in this supporting electrolyte. Cyclic voltammetry and electrochemical impedance spectroscopy techniques were used to demonstrate the deposition processes on Pt and Cu electrodes. Long-time electrolyses (30–120 min) performed at 60 °C with potential control (between −0.22 and −0.37 V vs. Ag reference electrode) have resulted in films deposited on copper substrate. Film surfaces were studied by scanning electron microscopy and analyzed by energy dispersive X-ray spectroscopy. The results of this study show that ChCl–OxA ionic liquid may be considered as a promising substitute of aqueous baths for Bi, Te or Bi
2
Te
3
film plating. |
---|---|
ISSN: | 0021-891X 1572-8838 |
DOI: | 10.1007/s10800-012-0487-0 |