Real-time gray-scale photolithography for fabrication of continuous microstructure

A novel real-time gray-scale photolithography technique for the fabrication of continuous microstructures that uses a LCD panel as a real-time gray-scale mask is presented. The principle of design of the technique is explained, and computer simulation results based on partially coherent imaging theo...

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Bibliographic Details
Published inOptics letters Vol. 27; no. 19; p. 1720
Main Authors Peng, Qinjun, Guo, Yongkang, Liu, Shijie, Cui, Zheng
Format Journal Article
LanguageEnglish
Published United States 01.10.2002
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Summary:A novel real-time gray-scale photolithography technique for the fabrication of continuous microstructures that uses a LCD panel as a real-time gray-scale mask is presented. The principle of design of the technique is explained, and computer simulation results based on partially coherent imaging theory are given for the patterning of a microlens array and a zigzag grating. An experiment is set up, and a microlens array and a zigzag grating on panchromatic silver halide sensitized gelatin with trypsinase etching are obtained.
ISSN:0146-9592
DOI:10.1364/OL.27.001720