Development and applications of time-of-flight neutron depth profiling (TOF-NDP)

Neutron depth profiling (NDP) is a surface analysis technique based on the irradiation of samples with thermal or sub-thermal neutrons, and subsequent release of charged particles. Emitted particles rapidly lose kinetic energy primarily through interactions with the electrons of the substrate materi...

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Bibliographic Details
Published inJournal of radioanalytical and nuclear chemistry Vol. 276; no. 3; pp. 623 - 630
Main Authors Çetiner, S. M., Ünlü, K., Downing, R. G.
Format Journal Article
LanguageEnglish
Published Dordrecht Springer Netherlands 01.06.2008
Subjects
Chemistry
Chemistry and Materials Science
Diagnostic Radiology
Hadrons
Heavy Ions
Inorganic Chemistry
Nuclear Chemistry
Nuclear Physics
Physical Chemistry
Semiconductor Detector
Source Layer
Microchannel Plate
Neutron Depth Profile
Recoil Nucleus
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Summary:Neutron depth profiling (NDP) is a surface analysis technique based on the irradiation of samples with thermal or sub-thermal neutrons, and subsequent release of charged particles. Emitted particles rapidly lose kinetic energy primarily through interactions with the electrons of the substrate material. The depth of the reaction site can be found by using stopping power correlations. In conventional NDP, particle residual energy is measured by using a silicon semiconductor detector. In time-of-flight NDP (TOF-NDP), the energy can be determined by particle flight time. Time measurement can be made more sensitively than the energy measurement. Silicon semiconductor detectors can be replaced by microchannel plates (MCP). In this study, TOF-NDP concept will be briefly explained; Penn State TOF-NDP facility will be introduced; preliminary measurements performed with an alpha-source will be presented.
ISSN:0236-5731
1588-2780
DOI:10.1007/s10967-008-0609-7