Multi-oxide active layer deposition using Applied Materials Pivot array coater for high-mobility metal oxide TFT

• Published in: Applied physics. A, Materials science & processing Vol. 121; no. 2; pp. 535 - 539
• Main Authors: Park, Hyun Chan, Scheer, Evelyn, Witting, Karin, Hanika, Markus, Bender, Marcus, Hsu, Hao Chien, Yim, Dong Kil
• Format: Journal Article
• Language: English
• Published: Berlin/Heidelberg Springer Berlin Heidelberg 01.11.2015
• Subjects: Characterization and Evaluation of Materials; Condensed Matter Physics; Machines; Manufacturing; Nanotechnology; Optical and Electronic Materials; Physics; Physics and Astronomy; Processes; Rapid Communication; Surfaces and Interfaces; Thin Films; Oxygen Partial Pressure; Indium Zinc Oxide; Thin Interface Layer; Rotary Target; Indium Gallium Zinc Oxide
• ISSN: 0947-8396; 1432-0630
• DOI: 10.1007/s00339-015-9459-7

By controlling a thin indium tin oxide (ITO), indium zinc oxide interface layer between gate insulator and indium gallium zinc oxide (IGZO), the thin-film transistor (TFT) performance can reach higher mobility as conventional IGZO as well as superior stability. For large-area display application, Applied Materials static PVD array coater (Applied Materials GmbH & Co. KG, Alzenau, Germany) using rotary targets has been developed to enable uniform thin layer deposition in display industry. Unique magnet motion parameter optimization in Pivot sputtering coater is shown to provide very uniform thin ITO layer to reach TFT performance with high mobility, not only on small scale, but also on Gen8.5 (2500 × 2200 mm glass size) production system.