Photostimulated transformations in nanosized MoO3 films

Irradiation of MoO 3 films (with a thickness d = 5–54 nm) with light (λ = 320 nm, I = (1.5–7) × 10 15 quantum cm −2 s −1 ) led to the formation of an absorption band at λ = 870 nm along with the shift of the edge of the absorption band to the short-wave region of the spectrum. Further irradiation of...

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Bibliographic Details
Published inRussian Journal of Physical Chemistry A Vol. 87; no. 12; pp. 2063 - 2067
Main Authors Surovoi, E. P., Borisova, N. V., Bugerko, L. N., Surovaya, V. E., Ramazanova, G. O.
Format Journal Article
LanguageEnglish
Published Boston Springer US 01.12.2013
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Summary:Irradiation of MoO 3 films (with a thickness d = 5–54 nm) with light (λ = 320 nm, I = (1.5–7) × 10 15 quantum cm −2 s −1 ) led to the formation of an absorption band at λ = 870 nm along with the shift of the edge of the absorption band to the short-wave region of the spectrum. Further irradiation of the samples with light at λ = 870 nm caused diffusion of the long-wave absorption band. The conversion of MoO 3 films increased when the incident light intensity and irradiation time increased and the film thickness decreased under the atmospheric conditions. A mechanism of the photochemical transformation of MoO 3 films was suggested. It involves the generation of electron-hole pairs, recombination of some nonequilibrium charge carriers, formation of [( e ( V a ) ++ e ] centers, and isolation of photolysis products.
ISSN:0036-0244
1531-863X
DOI:10.1134/S0036024413120248