Study of doped higher manganese silicides crystals by transmission electron diffraction and electron backscatter diffraction
The microstructure of Al-, Ge-, and Mo-doped higher manganese silicide crystals (HMS), grown by the Bridgman method have been investigated by transmission electron diffraction, electron backscatter diffraction, scanning electron microscopy, and X-ray energy-dispersive spectrometry. It is shown that...
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Published in | Crystallography reports Vol. 59; no. 1; pp. 78 - 87 |
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Main Authors | , |
Format | Journal Article |
Language | English |
Published |
Boston
Springer US
2014
|
Subjects | |
Online Access | Get full text |
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Summary: | The microstructure of Al-, Ge-, and Mo-doped higher manganese silicide crystals (HMS), grown by the Bridgman method have been investigated by transmission electron diffraction, electron backscatter diffraction, scanning electron microscopy, and X-ray energy-dispersive spectrometry. It is shown that the matrix crystal has the Mn
4
Si
7
structure. The introduction of Ge and Mo impurities into an HMS crystal results in the precipitation of Si-Ge solid solution and molybdenum disilicide. The size of precipitates varies in a wide range: from several nanometers to several hundreds of micrometers. The following orientation relationships between Ge-Si precipitates and the Mn
4
Si
7
crystal were determined: (112)
Ge-Si ‖ (010)[100] Mn
4
Si
7
. Polycrystalline MoSi
2
precipitates form a multicomponent texture along the [001] Mn
4
Si
7
direction. Small amounts of cubic MnSi and Al-Mn-Si alloy precipitates were revealed. In addition, Al oxide was observed mainly in crystal pores. It is shown that 0.5–0.8 at % Al, 0.4–0.6 at % Mo, and 1.5–2.0 at % Ge impurities are incorporated into the Mn
4
Si
7
lattice. |
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ISSN: | 1063-7745 1562-689X |
DOI: | 10.1134/S106377451401009X |