SiO2 nanodot arrays using patterned functionalization of self-assembled block copolymer and selective adsorption of amine-terminated polydimethylsiloxane

Silicon dioxide (SiO 2 ) nanodot arrays were fabricated by the selective adsorption of amine-terminated polydimethylsiloxane on functionalized block copolymer thin films. A polystyrene- b -poly(acrylic acid/acrylic anhydride) thin film was created by the acid-catalyzed thermal deprotection of polyst...

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Bibliographic Details
Published inMacromolecular research Vol. 19; no. 9; pp. 891 - 896
Main Authors Kim, Su Min, Ku, Se Jin, Kim, Jin-Baek
Format Journal Article
LanguageEnglish
Published Heidelberg The Polymer Society of Korea 01.09.2011
Subjects
Characterization and Evaluation of Materials
Chemistry
Chemistry and Materials Science
Complex Fluids and Microfluidics
Nanochemistry
Nanotechnology
Physical Chemistry
Polymer Sciences
Soft and Granular Matter
block copolymer
selective adsorption
self-assembly
polydimethylsiloxane
nanodot array
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Summary:Silicon dioxide (SiO 2 ) nanodot arrays were fabricated by the selective adsorption of amine-terminated polydimethylsiloxane on functionalized block copolymer thin films. A polystyrene- b -poly(acrylic acid/acrylic anhydride) thin film was created by the acid-catalyzed thermal deprotection of polystyrene- b -poly( tert -butyl acrylate). The amine-terminated polydimethylsiloxane selectively adsorbed on poly(acrylic acid) (PAA)/(acrylic anhydride) (AN) spherical nanodomains using a simple dipping method. Patterned SiO 2 nanodot arrays were also fabricated using polystyrene- b -poly( tert -butyl acrylate) coated on the patterned SU-8 film. The final SiO 2 nanodot arrays were obtained by the calcination of an organosilicon film.
ISSN:1598-5032
2092-7673
DOI:10.1007/s13233-011-0903-z