Robust Gold Electrode Fabrication in a Microfluidic System

Electrode fabrication in microfluidic devices is often avoided due to the smaller footprint of the platform, associated complexity in the process, and absence of a well-established method. In this article a glass microchip with chemically modified and vapor deposited gold internal electrode was fabr...

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Bibliographic Details
Published inAnalytical letters Vol. 57; no. 17; pp. 2927 - 2941
Main Authors Mahmud, Sakur, Dutta, Debashis
Format Journal Article
LanguageEnglish
Published Abingdon Taylor & Francis 21.11.2024
Taylor & Francis Ltd
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Summary:Electrode fabrication in microfluidic devices is often avoided due to the smaller footprint of the platform, associated complexity in the process, and absence of a well-established method. In this article a glass microchip with chemically modified and vapor deposited gold internal electrode was fabricated and used for biomolecule immobilization and electrochemical applications. The silanol (-OH) on glass surface of the microdevice was modified with (3-mercaptopropyl)trimethoxysilane prior to gold deposition to achieve a strong attachment of the metal film using the gold-thiol binding. The practical utility of the microdevice with gold surface was demonstrated by performing quantitative enzyme linked immunosorbent assay (ELISA) of human interferon gamma (IFN-γ) antigen, yielding a limit of detection (LOD) of 0.15 pg/mL compared to 4 pg/mL in the microplate assay. Additionally, the functionality of the internal electrode was established by performing cyclic voltammetry (CV) and linear sweep voltammetry (LSV) of potassium ferricyanide (III) in potassium chloride (KCl) solution using the proposed gold patterned electrode in the microchip, offering limits of detection of 0.14 and 0.11 mM for CV and LSV respectively. Both the ELISA and electrochemical assays were validated by generating calibration curves and using a control sample for the electroanalytical sensing applications. The measurements yielded experimental results that agreed with control concentration with 7% relative standard deviation (RSD). The promising reproducibility of the electrode in fabrication with no/minimum failure rate and its outstanding performance in immunosensor applications as well as an electron exchange surface makes our technique of gold electrode fabrication in microchips a state of the art.
ISSN:0003-2719
1532-236X
DOI:10.1080/00032719.2024.2307458