Low-temperature deposition of μc-Si: H thin films by a low-frequency inductively coupled plasma for photovoltaic applications
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Published in | Journal of physics. D, Applied physics Vol. 46; no. 21; p. 215501 |
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Main Authors | , , , , , , , , , |
Format | Journal Article |
Language | English |
Published |
Bristol
Institute of Physics
29.05.2013
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Subjects | |
Online Access | Get full text |
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ISSN: | 0022-3727 1361-6463 |
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DOI: | 10.1088/0022-3727/46/21/215501 |