Combustion-process derived comparable performances of Zn-(In:Sn)-O thin-film transistors with a complete miscibility

Amorphous zinc-indium-tin oxide (a-ZITO) thin-film transistors (TFTs) have been prepared using a low-temperature combustion process, with an emphasis on complete miscibility of In and Sn contents. The a-ZITO TFTs were comparatively studied in detail, especially for the working stability. The a-ZITO...

Full description

Saved in:
Bibliographic Details
Published inApplied physics letters Vol. 105; no. 13
Main Authors Jiang, Qingjun, Lu, Jianguo, Cheng, Jipeng, Li, Xifeng, Sun, Rujie, Feng, Lisha, Dai, Wen, Yan, Weichao, Ye, Zhizhen
Format Journal Article
LanguageEnglish
Published Melville American Institute of Physics 29.09.2014
Subjects
Online AccessGet full text
ISSN0003-6951
1077-3118
DOI10.1063/1.4896990

Cover

Loading…
Abstract Amorphous zinc-indium-tin oxide (a-ZITO) thin-film transistors (TFTs) have been prepared using a low-temperature combustion process, with an emphasis on complete miscibility of In and Sn contents. The a-ZITO TFTs were comparatively studied in detail, especially for the working stability. The a-ZITO TFTs all exhibited acceptable and excellent behaviors from Sn-free TFTs to In-free TFTs. The obtained a-ZTO TFTs presented a field-effect mobility of 1.20 cm2 V−1 s−1, an on/off current ratio of 4.89 × 106, and a long-term stability under positive bias stress, which are comparable with those of the a-ZIO TFTs. The In-free a-ZTO TFTs are very potential for electrical applications with a low cost.
AbstractList Amorphous zinc-indium-tin oxide (a-ZITO) thin-film transistors (TFTs) have been prepared using a low-temperature combustion process, with an emphasis on complete miscibility of In and Sn contents. The a-ZITO TFTs were comparatively studied in detail, especially for the working stability. The a-ZITO TFTs all exhibited acceptable and excellent behaviors from Sn-free TFTs to In-free TFTs. The obtained a-ZTO TFTs presented a field-effect mobility of 1.20 cm2 V−1 s−1, an on/off current ratio of 4.89 × 106, and a long-term stability under positive bias stress, which are comparable with those of the a-ZIO TFTs. The In-free a-ZTO TFTs are very potential for electrical applications with a low cost.
Amorphous zinc-indium-tin oxide (a-ZITO) thin-film transistors (TFTs) have been prepared using a low-temperature combustion process, with an emphasis on complete miscibility of In and Sn contents. The a-ZITO TFTs were comparatively studied in detail, especially for the working stability. The a-ZITO TFTs all exhibited acceptable and excellent behaviors from Sn-free TFTs to In-free TFTs. The obtained a-ZTO TFTs presented a field-effect mobility of 1.20 cm{sup 2} V{sup −1} s{sup −1}, an on/off current ratio of 4.89 × 10{sup 6}, and a long-term stability under positive bias stress, which are comparable with those of the a-ZIO TFTs. The In-free a-ZTO TFTs are very potential for electrical applications with a low cost.
Author Feng, Lisha
Jiang, Qingjun
Dai, Wen
Li, Xifeng
Lu, Jianguo
Yan, Weichao
Sun, Rujie
Cheng, Jipeng
Ye, Zhizhen
Author_xml – sequence: 1
  givenname: Qingjun
  surname: Jiang
  fullname: Jiang, Qingjun
– sequence: 2
  givenname: Jianguo
  surname: Lu
  fullname: Lu, Jianguo
– sequence: 3
  givenname: Jipeng
  surname: Cheng
  fullname: Cheng, Jipeng
– sequence: 4
  givenname: Xifeng
  surname: Li
  fullname: Li, Xifeng
– sequence: 5
  givenname: Rujie
  surname: Sun
  fullname: Sun, Rujie
– sequence: 6
  givenname: Lisha
  surname: Feng
  fullname: Feng, Lisha
– sequence: 7
  givenname: Wen
  surname: Dai
  fullname: Dai, Wen
– sequence: 8
  givenname: Weichao
  surname: Yan
  fullname: Yan, Weichao
– sequence: 9
  givenname: Zhizhen
  surname: Ye
  fullname: Ye, Zhizhen
BackLink https://www.osti.gov/biblio/22350799$$D View this record in Osti.gov
BookMark eNptkEtrGzEUhUVJoE7SRf-BoJtmIVuPjDTqrpjmAYYs2m66ERrNFZaZkRxJbvG_j_KAQOjqcuC759x7ztBJTBEQ-szoklEpVmx51WupNf2AFowqRQRj_QlaUEoFkbpjH9FZKbsmOy7EAtV1modDqSFFss_JQSl4hBz-wohdmvc222ECvIfsU55tbABOHv-J5Otd_PYzXpJ7XLchEh-mGddsYwmlplzwv1C32D6bTFABz6G4MIQp1OMFOvV2KvDpdZ6j39c_fq1vyeb-5m79fUMc77tKBq6Y173s6cil4xxg5BS0g74bvWdDU5R6rpTtlfJKKhjZcCWoHKXonevEOfry4pvag6bFV3Bbl2IEVw3noqNK6zeq_f9wgFLNLh1ybIcZzrjseKclbdTlC-VyKiWDN_scZpuPhlHzVL1h5rX6xq7esS3aPnXcCgrTfzYeAfn3h30
CitedBy_id crossref_primary_10_1109_TED_2016_2555848
crossref_primary_10_1016_j_apsusc_2015_09_253
crossref_primary_10_3389_fchem_2021_754487
crossref_primary_10_1007_s00339_018_2280_3
crossref_primary_10_1039_C5RA09670G
crossref_primary_10_1039_C7RA12642E
crossref_primary_10_1007_s40843_018_9380_8
crossref_primary_10_1063_1_5031448
crossref_primary_10_1016_j_cap_2018_10_012
crossref_primary_10_1063_1_4906999
crossref_primary_10_1007_s00339_019_2646_1
crossref_primary_10_1016_j_jallcom_2019_03_277
crossref_primary_10_1039_D0TC02655G
crossref_primary_10_1016_j_cossms_2023_101092
crossref_primary_10_1109_TED_2016_2542860
crossref_primary_10_1002_pssa_201532774
crossref_primary_10_1002_aelm_202000464
crossref_primary_10_1016_j_jallcom_2018_04_058
crossref_primary_10_1088_1674_4926_44_5_052101
crossref_primary_10_1021_acsami_5b02215
crossref_primary_10_1021_acsami_5b07148
crossref_primary_10_1039_C5RA02125A
crossref_primary_10_1109_LED_2017_2707090
crossref_primary_10_1109_TED_2019_2913866
crossref_primary_10_1039_C6RA02924H
crossref_primary_10_1021_acs_chemmater_7b03618
crossref_primary_10_1016_j_surfcoat_2016_07_052
crossref_primary_10_1002_aelm_202000233
Cites_doi 10.1063/1.3656444
10.1002/adma.200400368
10.1063/1.2425020
10.1063/1.4818728
10.1088/1468-6996/11/4/044305
10.1063/1.1843286
10.1063/1.2824758
10.1038/nmat3011
10.1016/0040-6090(95)06543-1
10.1002/adma.201103228
10.1063/1.2723543
10.1126/science.1083212
10.1039/c3ra44513e
10.1063/1.3159831
10.1109/TED.2014.2312947
10.1063/1.2977865
10.1021/ja403586x
10.1063/1.3524514
10.1002/adma.201204236
10.1021/ja100615r
10.1063/1.2990657
ContentType Journal Article
Copyright 2014 AIP Publishing LLC.
Copyright_xml – notice: 2014 AIP Publishing LLC.
DBID AAYXX
CITATION
8FD
H8D
L7M
OTOTI
DOI 10.1063/1.4896990
DatabaseName CrossRef
Technology Research Database
Aerospace Database
Advanced Technologies Database with Aerospace
OSTI.GOV
DatabaseTitle CrossRef
Technology Research Database
Aerospace Database
Advanced Technologies Database with Aerospace
DatabaseTitleList Technology Research Database

CrossRef
DeliveryMethod fulltext_linktorsrc
Discipline Engineering
Physics
EISSN 1077-3118
ExternalDocumentID 22350799
10_1063_1_4896990
GroupedDBID -DZ
-~X
.DC
1UP
2-P
23M
4.4
53G
5GY
5VS
6J9
A9.
AAAAW
AABDS
AAGWI
AAGZG
AAPUP
AAYIH
AAYXX
ABFTF
ABJGX
ABJNI
ABRJW
ABZEH
ACBEA
ACBRY
ACGFO
ACGFS
ACLYJ
ACNCT
ACZLF
ADCTM
ADMLS
AEGXH
AEJMO
AENEX
AFATG
AFHCQ
AGKCL
AGLKD
AGMXG
AGTJO
AHSDT
AIAGR
AJJCW
AJQPL
ALEPV
ALMA_UNASSIGNED_HOLDINGS
AQWKA
ATXIE
AWQPM
BDMKI
BPZLN
CITATION
CS3
D0L
EBS
EJD
F.2
F5P
FDOHQ
FFFMQ
HAM
M6X
M71
M73
N9A
NPSNA
O-B
P2P
RIP
RNS
RQS
SJN
TAE
TN5
UPT
WH7
XJE
YZZ
~02
8FD
H8D
L7M
0ZJ
AAEUA
ABPTK
AGIHO
ESX
OTOTI
UCJ
UE8
ID FETCH-LOGICAL-c285t-b271f98680d26c22eed20e9ce85dff1bd2000f277a877f767ed1b4306d638cc53
ISSN 0003-6951
IngestDate Thu May 18 22:35:07 EDT 2023
Mon Jun 30 06:57:10 EDT 2025
Tue Jul 01 04:19:14 EDT 2025
Thu Apr 24 22:57:15 EDT 2025
IsPeerReviewed true
IsScholarly true
Issue 13
Language English
LinkModel OpenURL
MergedId FETCHMERGED-LOGICAL-c285t-b271f98680d26c22eed20e9ce85dff1bd2000f277a877f767ed1b4306d638cc53
Notes ObjectType-Article-1
SourceType-Scholarly Journals-1
ObjectType-Feature-2
content type line 14
PQID 2126525960
PQPubID 2050678
ParticipantIDs osti_scitechconnect_22350799
proquest_journals_2126525960
crossref_primary_10_1063_1_4896990
crossref_citationtrail_10_1063_1_4896990
ProviderPackageCode CITATION
AAYXX
PublicationCentury 2000
PublicationDate 2014-09-29
20140929
PublicationDateYYYYMMDD 2014-09-29
PublicationDate_xml – month: 09
  year: 2014
  text: 2014-09-29
  day: 29
PublicationDecade 2010
PublicationPlace Melville
PublicationPlace_xml – name: Melville
– name: United States
PublicationTitle Applied physics letters
PublicationYear 2014
Publisher American Institute of Physics
Publisher_xml – name: American Institute of Physics
References (2023070515315484200_c16) 2008; 93
(2023070515315484200_c19) 2007; 90
(2023070515315484200_c1) 2012; 24
(2023070515315484200_c7) 2010; 97
(2023070515315484200_c10) 2011; 10
(2023070515315484200_c20) 2008; 92
(2023070515315484200_c5) 2013; 135
(2023070515315484200_c8) 2013; 25
2023070515315484200_c12
(2023070515315484200_c3) 2003; 300
(2023070515315484200_c21) 2011; 110
(2023070515315484200_c13) 1995; 263
(2023070515315484200_c22) 2006; 89
(2023070515315484200_c17) 2009; 95
(2023070515315484200_c6) 2013; 103
(2023070515315484200_c9) 2005; 86
(2023070515315484200_c11) 2010; 132
(2023070515315484200_c18) 2008; 93
(2023070515315484200_c4) 2010; 11
(2023070515315484200_c15) 2014; 61
(2023070515315484200_c2) 2014; 4
(2023070515315484200_c14) 2005; 17
References_xml – volume: 110
  start-page: 084509
  year: 2011
  ident: 2023070515315484200_c21
  publication-title: J. Appl. Phys.
  doi: 10.1063/1.3656444
– volume: 17
  start-page: 590
  year: 2005
  ident: 2023070515315484200_c14
  publication-title: Adv. Mater.
  doi: 10.1002/adma.200400368
– volume: 89
  start-page: 263513
  year: 2006
  ident: 2023070515315484200_c22
  publication-title: Appl. Phys. Lett.
  doi: 10.1063/1.2425020
– volume: 103
  start-page: 082109
  year: 2013
  ident: 2023070515315484200_c6
  publication-title: Appl. Phys. Lett.
  doi: 10.1063/1.4818728
– volume: 11
  start-page: 044305
  year: 2010
  ident: 2023070515315484200_c4
  publication-title: Sci. Technol. Adv. Mater.
  doi: 10.1088/1468-6996/11/4/044305
– volume: 86
  start-page: 013503
  year: 2005
  ident: 2023070515315484200_c9
  publication-title: Appl. Phys. Lett.
  doi: 10.1063/1.1843286
– volume: 92
  start-page: 033502
  year: 2008
  ident: 2023070515315484200_c20
  publication-title: Appl. Phys. Lett.
  doi: 10.1063/1.2824758
– volume: 10
  start-page: 382
  year: 2011
  ident: 2023070515315484200_c10
  publication-title: Nature Mater.
  doi: 10.1038/nmat3011
– volume: 263
  start-page: 37
  year: 1995
  ident: 2023070515315484200_c13
  publication-title: Thin Solid Films
  doi: 10.1016/0040-6090(95)06543-1
– volume: 24
  start-page: 2945
  year: 2012
  ident: 2023070515315484200_c1
  publication-title: Adv. Mater.
  doi: 10.1002/adma.201103228
– volume: 90
  start-page: 192101
  year: 2007
  ident: 2023070515315484200_c19
  publication-title: Appl. Phys. Lett.
  doi: 10.1063/1.2723543
– volume: 300
  start-page: 1269
  year: 2003
  ident: 2023070515315484200_c3
  publication-title: Science
  doi: 10.1126/science.1083212
– volume: 4
  start-page: 3145
  year: 2014
  ident: 2023070515315484200_c2
  publication-title: RSC Adv.
  doi: 10.1039/c3ra44513e
– volume: 95
  start-page: 013502
  year: 2009
  ident: 2023070515315484200_c17
  publication-title: Appl. Phys. Lett.
  doi: 10.1063/1.3159831
– volume: 61
  start-page: 1431
  year: 2014
  ident: 2023070515315484200_c15
  publication-title: IEEE Trans. Electron Devices
  doi: 10.1109/TED.2014.2312947
– volume: 93
  start-page: 093504
  year: 2008
  ident: 2023070515315484200_c16
  publication-title: Appl. Phys. Lett.
  doi: 10.1063/1.2977865
– ident: 2023070515315484200_c12
– volume: 135
  start-page: 10729
  year: 2013
  ident: 2023070515315484200_c5
  publication-title: J. Am. Chem. Soc.
  doi: 10.1021/ja403586x
– volume: 97
  start-page: 233502
  year: 2010
  ident: 2023070515315484200_c7
  publication-title: Appl. Phys. Lett.
  doi: 10.1063/1.3524514
– volume: 25
  start-page: 2994
  year: 2013
  ident: 2023070515315484200_c8
  publication-title: Adv. Mater.
  doi: 10.1002/adma.201204236
– volume: 132
  start-page: 10352
  year: 2010
  ident: 2023070515315484200_c11
  publication-title: J. Am. Chem. Soc.
  doi: 10.1021/ja100615r
– volume: 93
  start-page: 123508
  year: 2008
  ident: 2023070515315484200_c18
  publication-title: Appl. Phys. Lett.
  doi: 10.1063/1.2990657
SSID ssj0005233
Score 2.292468
Snippet Amorphous zinc-indium-tin oxide (a-ZITO) thin-film transistors (TFTs) have been prepared using a low-temperature combustion process, with an emphasis on...
SourceID osti
proquest
crossref
SourceType Open Access Repository
Aggregation Database
Enrichment Source
Index Database
SubjectTerms AMORPHOUS STATE
Applied physics
CARRIER MOBILITY
COMBUSTION
CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY
INDIUM OXIDES
Indium tin oxides
Miscibility
Semiconductor devices
SOLUBILITY
STABILITY
Thin film transistors
THIN FILMS
Tin
TIN OXIDES
TRANSISTORS
ZINC OXIDES
Title Combustion-process derived comparable performances of Zn-(In:Sn)-O thin-film transistors with a complete miscibility
URI https://www.proquest.com/docview/2126525960
https://www.osti.gov/biblio/22350799
Volume 105
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwnV1Lb9NAEF6FVEhwQFBAFApaIQ5F0RY_115uFQ8VRCkorRRxsex9SEapHRGHQ389M_Zu7JAcChcrWW-yiefz7Mz4mxlCXiVFDi61J5kvpWIRNz4TXPtMS6MCeAtGCiY4n33lp5fR51k8G42uh9klTXEsr3fmlfyPVGEM5IpZsv8g2fWXwgC8BvnCESQMxxvJGG7mArtx1RVbdIT_iYJ1f2tlueVtXtSizw1oeRs_KoZmJVI6phgVYOdgfZYVM-X8CltGVMu2dIjLe-tY52BbT64wg7cl0248C3aGbBckWU7mbYZQT00sbUj6O-ySP1c9BWjVIgjPruqeZaAtRbhcaLup4tyWczArjRuzcQo_QlKFDWY43RsyLmx5Wd2pWy_BKKnVwE4fe_EQeOFORQ-WFcYcjqNUcNE1HN0spv3XJremHrYP3XmY-Zn96C2yF4CLAUp97-T92ZfpgCAUhq7fIv5uV5eKh2_W625YM-MaJL61p7eGysV9cs96GPSkg8sDMtLVPrk7qDu5T25_60T1kDTbEKIWQrSHEB1CiNaGAoSOPlVvp9Vrdk7X4KED8FAED82pAw8dgOcRufz44eLdKbONOJgM0rhhRZD4RqQ89VTAZRCAXRV4WmDHW2WMXyjM9zJwFfM0SUzCE638IgJnVIF2lzIOH5NxVVf6CaFp7hkOWkOoxIvyUBZC5Xkc8cgzkvu6OCBH7oJm0lapx2Yp82xLcAfk5XrqoivNsmvSIUolg7-IRZElssdkk4FRDI6QEHDaSSuzN_YyA2uOx0EMvv3TmyzxjNzp8X5Ixs2vlX4OlmpTvLCQ-gOBy5Ws
linkProvider EBSCOhost
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Ajournal&rft.genre=article&rft.atitle=Combustion-process+derived+comparable+performances+of+Zn-%28In%3ASn%29-O+thin-film+transistors+with+a+complete+miscibility&rft.jtitle=Applied+physics+letters&rft.au=Jiang%2C+Qingjun&rft.au=Lu%2C+Jianguo&rft.au=Cheng%2C+Jipeng&rft.au=Li%2C+Xifeng&rft.date=2014-09-29&rft.issn=0003-6951&rft.eissn=1077-3118&rft.volume=105&rft.issue=13&rft_id=info:doi/10.1063%2F1.4896990&rft.externalDBID=n%2Fa&rft.externalDocID=10_1063_1_4896990
thumbnail_l http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/lc.gif&issn=0003-6951&client=summon
thumbnail_m http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/mc.gif&issn=0003-6951&client=summon
thumbnail_s http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/sc.gif&issn=0003-6951&client=summon