A positively biased external anode for energy control of plasma ions: hollow cathode and magnetron sputtering discharge
Abstract The performance of a positively biased external ring anode in combination with a hollow cathode (HC) discharge or a magnetron sputtering (MS) discharge, both with a Ti cathode and with Ar as working gas, is investigated. Plasma and floating potential increase as function of anode voltage. E...
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Published in | Plasma sources science & technology Vol. 30; no. 4; p. 45003 |
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Main Authors | , , |
Format | Journal Article |
Language | English |
Published |
01.04.2021
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Online Access | Get full text |
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