Deposition and characterization of a- and μc-Si:H thin films by ICP-CVD system with internal antennas

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Bibliographic Details
Published inSurface & coatings technology Vol. 231; pp. 550 - 556
Main Authors HSIEH, J. H, LIANG, H. C, SETSUHARA, Y, LI, C
Format Conference Proceeding Journal Article
LanguageEnglish
Published Amsterdam Elsevier 01.09.2013
Subjects
Cross-disciplinary physics: materials science; rheology
Exact sciences and technology
Materials science
Methods of deposition of films and coatings; film growth and epitaxy
Physics
Surface treatments
Thin films
CVD
Plasma
ICP-CVD
Surface treatments
Si:H films
Plasma characterization
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ISSN:0257-8972
1879-3347
DOI:10.1016/j.surfcoat.2012.03.007