Fabrication of silica-anatase multilayer coating on a KCaZnSi glass substrate
A transparent, rigid amorphous silica (SiO 2)-anatase phase titania (TiO 2) multilayer coating was fabricated on KCaZnSi glass substrate (i.e. slide glass for optical microscope use). The silica and titania layers were successively fabricated in that order by the hydrolysis of Si-tetraethoxide in...
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Published in | Thin solid films Vol. 441; no. 1; pp. 50 - 55 |
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Main Authors | , |
Format | Journal Article |
Language | English |
Published |
Lausanne
Elsevier B.V
22.09.2003
Elsevier Science |
Subjects | |
Online Access | Get full text |
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Summary: | A transparent, rigid amorphous silica (SiO
2)-anatase phase titania (TiO
2) multilayer coating was fabricated on KCaZnSi glass substrate (i.e. slide glass for optical microscope use). The silica and titania layers were successively fabricated in that order by the hydrolysis of Si-tetraethoxide in ethanol and Ti-tetraethoxide in iso-propanol, respectively, at 20 °C and annealing in air at 350 °C after each cycle. X-ray diffraction profiles showed that the titania upperlayer was successfully transformed to polycrystalline anatase in samples where the thickness of the silica underlayer
d
s was 230 nm and/or that of the titania upperlayer
d
t was 99 nm and that no crystallization occurred in samples where
d
s and
d
t were 115 nm and 55 nm, respectively. No amorphous-anatase transformation occurred when the silica underlayer was not prepared nor when it was used as-deposited. This indicated that amorphous-anatase transformation in the upperlayer was hindered by the migration of elements diffused from the substrate. The silica underlayer of
d
s=115 nm was less effective as a barrier to these elements but was still sufficient when a thicker upperlayer, i.e.
d
t=99 nm, was fabricated. Ultraviolet–visible (UV–Vis) spectroscopy indicated efficient filtering of UV light by the multilayer coating where
d
s=115 nm and
d
t=99 nm. The absorption edge was determined to be at
λ=318 nm, while the loss of visible light was less than 12% per coating over the range of 480–850 nm. |
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ISSN: | 0040-6090 1879-2731 |
DOI: | 10.1016/S0040-6090(03)00885-X |