A linear Bragg–Fresnel optics fabricated for 1D focusing of 18 nm X-ray radiation

• Published in: Optics and laser technology Vol. 30; no. 6; pp. 403 - 406
• Main Authors: Le, Zichun, Liang, Jingqiu, Yao, Jinsong, Li, Chun
• Format: Journal Article
• Language: English
• Published: Oxford Elsevier Ltd 01.09.1998; Elsevier Science
• Subjects: Diffraction pattern; Electromagnetism; electron and ion optics; Exact sciences and technology; Fabrication; Fundamental areas of phenomenology (including applications); Instruments, apparatus, components and techniques common to several branches of physics and astronomy; Linear Bragg–Fresnel optics; Mo/Si multilayer; Physics; X- and γ-ray instruments and techniques; X- and γ-ray sources, mirrors, gratings and detectors; X-ray beams and x-ray optics; Fabrication; Linear Bragg–Fresnel optics; Diffraction pattern; Mo/Si multilayer; Multilayers; Diffractive optics; Focusing; X-ray optics; Theoretical study; Silicon; Experimental study; Mirrors; Molybdenum
• ISSN: 0030-3992; 1879-2545
• DOI: 10.1016/S0030-3992(98)00071-1

The theoretical and technique results of a 1D focusing linear Bragg–Fresnel optics working at 18 nm X-ray radiation are given in the present paper. A theoretical method describing its optical performances is introduced briefly, the parameters of the diffraction pattern are presented. The preparation of multilayer mirrors, the decision of X-ray absorber layer thickness and the fabrication process of the diffraction pattern are described. The studied results of thermal and chemical stabilities for Mo/Si multilayer structure are shown. Some measured results for the 1D focusing linear Bragg–Fresnel optics are given.