Krypton bubble formation and growth in sputtered gold

• Published in: Thin solid films Vol. 72; no. 2; pp. 361 - 372
• Main Authors: Patten, J.W., Bayne, M.A., Hays, D.D., Moss, R.W.
• Format: Journal Article
• Language: English
• Published: Elsevier B.V 01.01.1980
• ISSN: 0040-6090; 1879-2731
• DOI: 10.1016/0040-6090(80)90019-X

The sputtering parameters were adjusted to produce a krypton content of up to several atomic per cent in sputtered gold. The as-sputtered density was approximately 17.5 g cm -3 or 91% of the theoretical density for a krypton content of approximately 5 at.%. Krypton bubble formation and growth behavior were characterized as functions of heat treatment time and temperature (below the melting point) by transmission electron microscopy, optical metallography and density measurement. Krypton bubbles as small as 50 Å in diameter and densities down to 14.0 g cm -3 or 72% of the theoretical density were observed. Larger bubbles in excess of 1 μm in diameter were observed in the lowest density samples. Surface finishes to better than 20 μm were produced on the substrate sides of these sputtered deposits by replication of machined substrate surfaces. However, the surface finish was degraded with increasing deposit thickness for deposits containing up to 5 at.% Kr. Surfaces were also degraded by heat treatments sufficiently severe to produce large (1 μm in diameter) krypton bubbles intersecting the deposit surfaces.